Please use this identifier to cite or link to this item: http://hdl.handle.net/10397/4739
PIRA download icon_1.1View/Download Full Text
Title: Monte Carlo simulation of pulsed laser deposition
Authors: Lam, PM
Liu, SJ
Woo, CH 
Issue Date: 15-Jul-2002
Source: Physical review. B, Condensed matter and materials physics, 15 July 2002, v. 66, no. 4, 045408, p. 1-6
Abstract: Using the Monte Carlo method, we have studied the pulsed laser deposition process at the submonolayer regime. In our simulations, dissociation of an atom from a cluster is incorporated. Our results indicate that the pulsed laser deposition resembles molecular-beam epitaxy at very low intensity, and that it is characteristically different from molecular-beam epitaxy at higher intensity. We have also obtained the island size distributions. The scaling function for the island size distribution for pulsed laser deposition is different from that of molecular-beam epitaxy.
Keywords: Monte Carlo method
Laser
Publisher: American Physical Society
Journal: Physical review. B, Condensed matter and materials physics 
ISSN: 1098-0121
EISSN: 1550-235X
DOI: 10.1103/PhysRevB.66.045408
Rights: Physical Review B © 2002 The American Physical Society. The Journal's web site is located at http://prb.aps.org/
Appears in Collections:Journal/Magazine Article

Files in This Item:
File Description SizeFormat 
Lam_Monte_Carlo_Simulation.pdf229.9 kBAdobe PDFView/Open
Open Access Information
Status open access
File Version Version of Record
Access
View full-text via PolyU eLinks SFX Query
Show full item record

Page views

68
Last Week
6
Last month
Citations as of May 22, 2022

Downloads

123
Citations as of May 22, 2022

SCOPUSTM   
Citations

27
Last Week
0
Last month
Citations as of May 27, 2022

WEB OF SCIENCETM
Citations

27
Last Week
0
Last month
0
Citations as of May 26, 2022

Google ScholarTM

Check

Altmetric


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.