Please use this identifier to cite or link to this item: http://hdl.handle.net/10397/83
Title: Cobalt-tungsten-phosphorus alloy diffusion barrier coatings, methods for their preparation, and their use in plated articles
Authors: Man, HC 
Ng, WY
Yeung, CH
Lee, CY
Siu, CL
Tsui, RYC
Yeung, KLK
Keywords: Cobalt-tungsten-phosphorus alloy
Barrier coatings
Issue Date: 4-Mar-2003
Source: US Patent 6,528,185 B2. Washington, DC: US Patent and Trademark Office, 2003. How to cite?
Abstract: Techniques are provided for electrolessly depositing and electrodepositing CoWP barrier coating onto copper or copper alloys to prevent copper diffusion when forming layers on articles such as watch bracelets, watch cases, imitation jewelry, spectacle frames and metal buttons.
URI: http://hdl.handle.net/10397/83
Rights: Assignee: The Hong Kong Polytechnic University.
Assignee: Hong Kong Productivity Council.
Appears in Collections:Patent

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