Please use this identifier to cite or link to this item: http://hdl.handle.net/10397/79767
PIRA download icon_1.1View/Download Full Text
DC FieldValueLanguage
dc.contributorDepartment of Applied Physics-
dc.creatorXu, B-
dc.creatorZhu, CJ-
dc.creatorHe, XM-
dc.creatorZang, Y-
dc.creatorLin, SH-
dc.creatorLi, LB-
dc.creatorFeng, S-
dc.creatorLei, QQ-
dc.date.accessioned2018-12-21T07:13:19Z-
dc.date.available2018-12-21T07:13:19Z-
dc.identifier.issn1687-8108en_US
dc.identifier.urihttp://hdl.handle.net/10397/79767-
dc.language.isoenen_US
dc.publisherHindawi Publishing Corporationen_US
dc.rightsCopyright © 2018 Bei Xu et al. This is an open access article distributed under the Creative Commons Attribution License (https://creativecommons.org/licenses/by/4.0/), which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.en_US
dc.rightsThe following publication Xu, B., Zhu, C. J., He, X. M., Zang, Y., Lin, S. H., Li, L. B., … & Lei, Q. Q. (2018). First-principles calculations on atomic and electronic properties of Ge/4H-SiC heterojunction. Advances in Condensed Matter Physics, 8010351, 1-9 is available at https://dx.doi.org/10.1155/2018/8010351en_US
dc.titleFirst-principles calculations on atomic and electronic properties of Ge/4H-SiC heterojunctionen_US
dc.typeJournal/Magazine Articleen_US
dc.identifier.spage1en_US
dc.identifier.epage9en_US
dc.identifier.doi10.1155/2018/8010351en_US
dcterms.abstractFirst-principles calculation is employed to investigate atomic and electronic properties of Ge/SiC heterojunction with different Ge orientations. Based on the density functional theory, the work of adhesion, relaxation energy, density of states, and total charge density are calculated. It is shown that Ge(110)/4H-SiC(0001) heterointerface possesses higher adhesion energy than that of Ge(111)/4H-SiC(0001) interface, and hence Ge/4H-SiC(0001) heterojunction with Ge[110] crystalline orientation exhibits more stable characteristics. The relaxation energy of Ge(110)/4H-SiC(0001) heterojunction interface is lower than that of Ge(111)/4HSiC( 0001) interface, indicating that Ge(110)/4H-SiC(0001) interface is easier to form at relative low temperature. The interfacial bonding is analysed using partial density of states and total charge density distribution, and the results show that the bonding is contributed by the Ge-Si bonding.-
dcterms.accessRightsopen accessen_US
dcterms.bibliographicCitationAdvances in condensed matter physics, 2018, 8010351, p. 1-9-
dcterms.isPartOfAdvances in condensed matter physics-
dcterms.issued2018-
dc.identifier.isiWOS:000428888900001-
dc.identifier.eissn1687-8124en_US
dc.identifier.artn8010351en_US
dc.description.validate201812 bcrcen_US
dc.description.oaVersion of Recorden_US
dc.identifier.FolderNumberOA_IR/PIRAen_US
dc.description.pubStatusPublisheden_US
Appears in Collections:Journal/Magazine Article
Files in This Item:
File Description SizeFormat 
Xu_First-principles_Calculations_Atomic.pdf3.86 MBAdobe PDFView/Open
Open Access Information
Status open access
File Version Version of Record
Access
View full-text via PolyU eLinks SFX Query
Show simple item record

Page views

102
Last Week
3
Last month
Citations as of Apr 14, 2024

Downloads

95
Citations as of Apr 14, 2024

SCOPUSTM   
Citations

3
Citations as of Apr 19, 2024

WEB OF SCIENCETM
Citations

3
Citations as of Apr 18, 2024

Google ScholarTM

Check

Altmetric


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.