Please use this identifier to cite or link to this item: http://hdl.handle.net/10397/7841
Title: Selective patterning and scribing of Ti thin film on glass substrate by 532 nm picosecond laser
Authors: Yung, KC 
Cai, Z
Choy, HS
Issue Date: 2012
Publisher: Springer
Source: Applied physics. A, Materials science & processing, 2012, v. 107, no. 2, p. 351-355 How to cite?
Journal: Applied physics. A, Materials science & processing 
Abstract: In this paper, the feasibility of Ti film coated on glass substrate scribed via a 532 nm picosecond laser is investigated. Laser irradiations from the film side and from the transparent substrate side are performed for comparison. Optical microscopy, SEM, surface stylus and contact resistance measurement reveal that the Ti film can be completely removed with no damage to the glass substrate, using optimized process parameters. The complete removal threshold for the film for front-side scribing is found at 120 mJ/cm 2, while the minimum laser fluence for complete scribing is 70 mJ/cm 2 in the case of back-side scribing. The lines scribed from the front side exhibit obvious thermal effects such as heat affected zones, burr and micro cracks. Backside scribing exhibits non-thermal behavior, which also can increase the process speed for the scribing of a Ti film on glass to 1000 mm/s. This makes the back-side laser scribing of Ti film a promising technique.
URI: http://hdl.handle.net/10397/7841
ISSN: 0947-8396
EISSN: 1432-0630
DOI: 10.1007/s00339-012-6813-x
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