Please use this identifier to cite or link to this item: http://hdl.handle.net/10397/77871
Title: Low-dimensional Mo:BiVO4 photoanodes for enhanced photoelectrochemical activity
Authors: Huang, M
Bian, J 
Xiong, W
Huang, C
Zhang, R
Issue Date: 2018
Publisher: Royal Society of Chemistry
Source: Journal of materials chemistry A, 2018, v. 6, no. 8, p. 3602-3609 How to cite?
Journal: Journal of materials chemistry A 
Abstract: Vertically oriented pure BiVO4 and Mo-doped BiVO4 nanoworm array films with a diameter of about 100 nm were prepared using the pulsed laser deposition (PLD) technique. Photoanodes doped with 1% molybdenum at vanadium sites provided superior photocurrent density, up to 2.1 mA cm-2 and 1.7 mA cm-2 at 1.23 V vs. the reversible hydrogen electrode (RHE) with Na2SO3 as the hole scavenger for substrate to electrode illumination and electrolyte to electrode illumination, respectively. The improved photoelectrochemical (PEC) performance of 1% Mo:BiVO4 photoanodes primarily originated from an appropriately regulated composition and a desirably controlled porous morphology. The outstanding PEC performance highlights the significance of a vertically oriented nanoworm array nanoarchitecture with a large surface area as a promising photoanode that ensures enhanced light absorption without sacrificing effective charge collection. This study is expected to enable BiVO4 to be applied as an efficient photoanode in PEC water splitting processes and to open the door to the large-scale manufacture of metal oxide photoanodes using the PLD technique for highly efficient photochemical performance.
URI: http://hdl.handle.net/10397/77871
ISSN: 2050-7488
EISSN: 2050-7496
DOI: 10.1039/c7ta11132k
Appears in Collections:Journal/Magazine Article

Access
View full-text via PolyU eLinks SFX Query
Show full item record

SCOPUSTM   
Citations

4
Last Week
0
Last month
Citations as of Mar 12, 2019

WEB OF SCIENCETM
Citations

4
Last Week
0
Last month
Citations as of Mar 20, 2019

Page view(s)

17
Citations as of Mar 25, 2019

Google ScholarTM

Check

Altmetric


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.