Please use this identifier to cite or link to this item: http://hdl.handle.net/10397/76203
Title: Edge delamination of monolayer transition metal dichalcogenides
Authors: Ly, TH 
Yun, SJ
Thi, QH
Zhao, J 
Keywords: Tungsten disulfide
Molybdenum disulfide
Edge delaminate
AFM
TEM
PL
Issue Date: 2017
Publisher: American Chemical Society
Source: ACS nano, 2017, v. 11, no. 7, p. 7534-7541 How to cite?
Journal: ACS nano 
Abstract: Delamination of thin films from the supportive substrates is a critical issue within the thin film industry. The emergent two-dimensional, atomic layered materials, including transition metal dichalcogenides, are highly flexible; thus buckles and wrinkles can be easily generated and play vital roles in the corresponding physical properties. Here we introduce one kind of patterned buckling behavior caused by the delamination from a substrate initiated at the edges of the chemical vapor deposition synthesized monolayer transition metal dichalcogenides, led by thermal expansion mismatch. The atomic force microscopy and optical characterizations clearly showed the puckered structures associated with the strain, whereas the transmission electron microscopy revealed the special sawtooth-shaped edges, which break the geometrical symmetry for the buckling behavior of hexagonal samples. The condition of the edge delamination is in accordance with the fracture behavior of thin film interfaces. This edge delamination and buckling process is universal for most ultrathin two-dimensional materials, which requires more attention in various future
URI: http://hdl.handle.net/10397/76203
ISSN: 1936-0851
EISSN: 1936-086X
DOI: 10.1021/acsnano.7b04287
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