Please use this identifier to cite or link to this item: http://hdl.handle.net/10397/76163
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dc.contributorDepartment of Applied Physics-
dc.creatorJin, Q-
dc.creatorZheng, CY-
dc.creatorZhang, YC-
dc.creatorLu, CJ-
dc.creatorDai, JY-
dc.creatorWen, Z-
dc.date.accessioned2018-05-10T02:55:28Z-
dc.date.available2018-05-10T02:55:28Z-
dc.identifier.issn0003-6951-
dc.identifier.urihttp://hdl.handle.net/10397/76163-
dc.language.isoenen_US
dc.publisherAmerican Institute of Physicsen_US
dc.rights© 2017 Author(s).en_US
dc.rightsThis article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. This article appeared in Q. Jin et al., Appl. Phys. Lett. 111, 32902 (2017) and may be found at https://dx.doi.org/10.1063/1.4993938en_US
dc.titleEnhanced resistive memory in Nb-doped BaTiO3 ferroelectric diodesen_US
dc.typeJournal/Magazine Articleen_US
dc.identifier.volume111-
dc.identifier.issue3-
dc.identifier.doi10.1063/1.4993938-
dcterms.abstractIn this study, we report on enhanced resistive memory in BaTiO3-based ferroelectric diodes due to the doping of donors. A large ON/OFF current ratio of similar to 2000, about two orders of magnitude higher than that of Au/BaTiO3/SrRuO3, is achieved in a Au/Nb:BaTiO3/SrRuO3 diode at room temperature. This can be ascribed to the enhanced ferroelectric-modulation on the potential barrier at the Nb: BaTiO3/SrRuO3 interface associated with the (Nb-Ti4+(5+)) donors, which gives rise to an efficient control of device transport between a bulk-limited current in the ON state and an interface-limited Schottky emission in the OFF state. In contrast, the resistance switching is suppressed in a Au/Fe:BaTiO3/SrRuO3 device since the (Fe-Ti4+(3+))' acceptors suppress semiconducting character of the BaTiO3 thin film and make the polarization-modulation of the band diagram negligible. The present work facilitates the design of high-performance resistive memory devices based on ferroelectric diodes with controllable charged defects. Published by AIP Publishing.-
dcterms.accessRightsopen accessen_US
dcterms.bibliographicCitationApplied physics letters, 2017, v. 111, no. 3, 32902, p. 032902-1-032902-5-
dcterms.isPartOfApplied physics letters-
dcterms.issued2017-
dc.identifier.isiWOS:000406123100049-
dc.identifier.eissn1077-3118-
dc.identifier.artn32902-
dc.identifier.rosgroupid2017002315-
dc.description.ros2017-2018 > Academic research: refereed > Publication in refereed journal-
dc.description.validate201805 bcrc-
dc.description.oaVersion of Recorden_US
dc.identifier.FolderNumberOA_IR/PIRAen_US
dc.description.pubStatusPublisheden_US
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