Please use this identifier to cite or link to this item: http://hdl.handle.net/10397/74027
Title: Ni antidot structure via single-step anodization of Al/Ni films
Authors: Ng, SM 
Wong, WC 
Fang, X
Ye, H
Leung, CW 
Keywords: Anodization
Antidot structure
Issue Date: 2017
Publisher: Pergamon Press
Source: Solid-state electronics, 2017, p. 2 How to cite?
Journal: Solid-state electronics 
Abstract: Antidot nanostructures were fabricated on Ni films by a single-step anodization process of magnetron-sputtered Al/Ni/W trilayers. Coercivity and saturation magnetization of the Ni layer were tuned by controlling the anodization time. Transmission electron microscopy was used to investigate the mechanism of the antidot formation process. The present study provides a simple and direct route for the fabrication of magnetic antidot nanostructures for device applications.
URI: http://hdl.handle.net/10397/74027
ISSN: 0038-1101
DOI: 10.1016/j.sse.2017.09.008
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