Please use this identifier to cite or link to this item: http://hdl.handle.net/10397/68473
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dc.contributorDepartment of Applied Physics-
dc.creatorHao, JH-
dc.creatorHuang, W-
dc.creatorYang, ZB-
dc.date.accessioned2017-08-22T05:55:08Z-
dc.date.available2017-08-22T05:55:08Z-
dc.identifier.urihttp://hdl.handle.net/10397/68473-
dc.language.isoenen_US
dc.rightsAssignee: The Hong Kong Polytechnic Univeristy.en_US
dc.titleSemiconductor gallium arsenide compatible epitaxial ferroelectric devices for microwave tunable applicationen_US
dc.typePatenten_US
dc.description.otherinformationUS8980648; US8980648 B1; US8980648B1; US8,980,648; US 8,980,648 B1; 8980648; Appl. No. 13/975,380en_US
dcterms.abstractThe presently claimed invention provides a barium strontium titanate/strontium titanate/gallium arsenide (BST/STO/GaAs) heterostructure comprising a gallium arsenide (GaAs) substrate, at least one strontium titanate (STO) layer, and at least one barium strontium titanate (BST) layer. The BST/STO/GaAs heterostructure of the present invention has a good temperature stability, high dielectric constant and low dielectric loss, which enable to fabricate tunable ferroelectric devices. A method for fabricating the BST/STO/GaAs heterostructure is also disclosed in the present invention, which comprises formation of at least one STO layer on the GaAs substrate by a first laser molecular beam epitaxial system, and formation of at least one BST layer on the STO layer by a second laser molecular beam epitaxial system.-
dcterms.bibliographicCitationUS Patent 8,980,648 B1. Washington, DC: US Patent and Trademark Office, 2015.-
dcterms.issued2015-03-17-
dc.description.countryUS-
dc.identifier.rosgroupid2014001962-
dc.description.ros2014-2015 > Other Outputs > Patents granted-
dc.description.oaVersion of Recorden_US
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