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Title: Exchange bias study of CoFeB/IrMn antidot and nanodot arrays fabricated by nanosphere lithography
Authors: Li, X
Leung, CW
Lin, KW
Chan, MS
Pong, PWT
Issue Date: 2016
Source: 2016 5th International Symposium on Next-Generation Electronics (ISNE), May 4-6, 2016, Hsinchu, Taiwan
Keywords: Exchange bias
Nanosphere lithography
Publisher: Institute of Electrical and Electronics Engineers
ISBN: 978-1-5090-2439-1
Appears in Collections:Conference Paper

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