Please use this identifier to cite or link to this item:
Title: Exchange bias study of CoFeB/IrMn antidot and nanodot arrays fabricated by nanosphere lithography
Authors: Li, X
Leung, CW
Lin, KW
Chan, MS
Pong, PWT
Keywords: Exchange bias
Nanosphere lithography
Issue Date: 2016
Publisher: Institute of Electrical and Electronics Engineers
Source: 2016 5th International Symposium on Next-Generation Electronics (ISNE), May 4-6, 2016, Hsinchu, Taiwan How to cite?
ISBN: 978-1-5090-2439-1
Appears in Collections:Conference Paper

View full-text via PolyU eLinks SFX Query
Show full item record

Page view(s)

Checked on Oct 16, 2017

Google ScholarTM


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.