Please use this identifier to cite or link to this item: http://hdl.handle.net/10397/66655
Title: Effect of improved contact on reliability of sub-60 nm carbon nanotube vias
Authors: Vyas, AA
Zhou, CJ
Chai, Y 
Wang, P
Yang, CY
Keywords: Carbon nanotubes
Contact resistance
Metallization
Interconnects
Current-carrying capacity
Issue Date: 2016
Publisher: Institute of Physics Publishing
Source: Nanotechnology, 16 Sept. 2016, v. 27, no. 37 How to cite?
Journal: Nanotechnology 
URI: http://hdl.handle.net/10397/66655
ISSN: 0957-4484
EISSN: 1361-6528
DOI: 10.1088/0957-4484/27/37/375202
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