Please use this identifier to cite or link to this item: http://hdl.handle.net/10397/61964
Title: Metallization of Al2O3 ceramic by magnetron sputtering Ti/Mo bilayer thin films for robust brazing to kovar alloy
Authors: Xin, C
Liu, W
Li, N
Yan, J
Shi, S 
Keywords: Al2O3 ceramic
Brazing
Kovar alloy
Magnetron sputtering
Metallization
Ti/Mo bilayer
Issue Date: 2016
Publisher: Pergamon Press
Source: Ceramics international, 2016, v. 42, no. 8, p. 9599-9604 How to cite?
Journal: Ceramics international 
Abstract: Ti/Mo bilayer thin films were deposited onto Al2O3 ceramic by magnetron sputtering with a subsequent high temperature sintering to ensure the robust brazing of Al2O3 ceramic to Kovar (Fe-Ni-Co) alloy. The interface reaction process between Ti film and Al2O3 ceramic as well as the joining strength between metallized Al2O3 ceramic and Kovar alloy were investigated systematically using X-ray diffraction, scanning electron microscopy, energy dispersive X-ray analysis, transmission electron microscopy, and electronic universal testing machine. The results show that the active Ti film can react with Al2O3 ceramic to form Ti3Al and TiO during high-temperature sintering process, in which the amount, size and morphology of TiO crucially depend on the sintering temperature. As the sintering temperature reaches 1200°C, a plenty of spherical TiO nanoparticles with ~ 150nm in diameter and metallic nature can be created across the Ti/Al2O3 interfaces, which can effectively act as 'bridges' to join Ti film to Al2O3 substrate firmly. Hence, the optimal joining strength of 69.6±3.1MPa between metallized Al2O3 ceramic and Kovar alloy can be obtained, much better than those counterparts metallized at 900°C and 1050°C almost without the existence of observable TiO.
URI: http://hdl.handle.net/10397/61964
ISSN: 0272-8842
EISSN: 1873-3956
DOI: 10.1016/j.ceramint.2016.03.044
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