Please use this identifier to cite or link to this item: http://hdl.handle.net/10397/57362
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dc.contributorDepartment of Industrial and Systems Engineering-
dc.creatorCheng, CT-
dc.creatorTo, S-
dc.creatorChan, CY-
dc.creatorCheung, CF-
dc.creatorLee, WB-
dc.date.accessioned2016-10-03T09:32:28Z-
dc.date.available2016-10-03T09:32:28Z-
dc.identifier.urihttp://hdl.handle.net/10397/57362-
dc.language.isoenen_US
dc.titleThe influence of ultra-precision machined patterns on self-cleaning propertiesen_US
dc.typeConference Paperen_US
dcterms.bibliographicCitation2nd International Conference on Nanomanufacturing, 1st CIRP Conference on Nanomanufacturing, Tianjin, China, 24-26 Sep 2010, paper no. 231 (CD)-
dcterms.issued2010-
dc.relation.conferenceInternational Conference on Nanomanufacturing [nanoMan]|CIRP Conference on Nanomanufacturing-
dc.identifier.rosgroupidr52409-
dc.description.ros2010-2011 > Academic research: refereed > Refereed conference paper-
Appears in Collections:Conference Paper
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