Please use this identifier to cite or link to this item:
http://hdl.handle.net/10397/57362| Title: | The influence of ultra-precision machined patterns on self-cleaning properties | Authors: | Cheng, CT To, S Chan, CY Cheung, CF Lee, WB |
Issue Date: | 2010 | Source: | 2nd International Conference on Nanomanufacturing, 1st CIRP Conference on Nanomanufacturing, Tianjin, China, 24-26 Sep 2010, paper no. 231 (CD) |
| Appears in Collections: | Conference Paper |
Show full item record
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.