Please use this identifier to cite or link to this item: http://hdl.handle.net/10397/57362
Title: The influence of ultra-precision machined patterns on self-cleaning properties
Authors: Cheng, CT
To, S 
Chan, CY 
Cheung, CF 
Lee, WB 
Issue Date: 2010
Source: 2nd International Conference on Nanomanufacturing, 1st CIRP Conference on Nanomanufacturing, Tianjin, China, 24-26 Sep 2010, paper no. 231 (CD) How to cite?
URI: http://hdl.handle.net/10397/57362
Appears in Collections:Conference Paper

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