Please use this identifier to cite or link to this item: http://hdl.handle.net/10397/57247
Title: Study of F-N tunneling characteristics of metal nanoclusters in high-k dielectric matrix as floating gate memory
Authors: Chan, KC
Lee, PF
Dai, JY 
Issue Date: 2008
Source: E-MRS 2008 Spring Meeting, Strasbourg, France, 26-30 May 2008, p. H-5 How to cite?
URI: http://hdl.handle.net/10397/57247
Appears in Collections:Conference Paper

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