Please use this identifier to cite or link to this item: http://hdl.handle.net/10397/56304
Title: Characteristics of HfAlO high-k dielectric as a barrier to oxygen and germanium diffusion on strained SiGe
Authors: Curreem, KK
Lee, PF
Dai, JY 
Issue Date: 2006
Source: The European Materials Research Society (E-MRS 2006) Spring Meeting, Nice, France, 29 May-2 June 2006, p. L-4 How to cite?
URI: http://hdl.handle.net/10397/56304
Appears in Collections:Conference Paper

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