Please use this identifier to cite or link to this item: http://hdl.handle.net/10397/539
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dc.contributorDepartment of Applied Physics-
dc.creatorZhu, JS-
dc.creatorSu, D-
dc.creatorLu, XM-
dc.creatorQin, HX-
dc.creatorWang, Y-
dc.creatorWang, D-
dc.creatorChan, HLW-
dc.creatorWong, KH-
dc.creatorChoy, CL-
dc.date.accessioned2014-12-11T08:28:04Z-
dc.date.available2014-12-11T08:28:04Z-
dc.identifier.issn0021-8979-
dc.identifier.urihttp://hdl.handle.net/10397/539-
dc.language.isoenen_US
dc.publisherAmerican Institute of Physicsen_US
dc.rights© 2002 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in J.S. Zhu et al. J. Appl. Phys. 92, 5420 (2002) and may be found at http://link.aip.org/link/?jap/92/5420en_US
dc.subjectBismuth compoundsen_US
dc.subjectLanthanum compoundsen_US
dc.subjectStrontium compoundsen_US
dc.subjectFerroelectric materialsen_US
dc.subjectFerroelectric thin filmsen_US
dc.subjectPulsed laser depositionen_US
dc.subjectFerroelectric capacitorsen_US
dc.subjectThin film capacitorsen_US
dc.subjectDielectric polarisationen_US
dc.titleLa-doped effect on the ferroelectric properties of Bi₄Ti₃O₁₂-SrBi₄Ti₄O[sub 15] thin film fabricated by pulsed laser depositionen_US
dc.typeJournal/Magazine Articleen_US
dc.description.otherinformationAuthor name used in this publication: Y. N. Wangen_US
dc.description.otherinformationAuthor name used in this publication: D. Y. Wangen_US
dc.description.otherinformationAuthor name used in this publication: H. L. W. Chanen_US
dc.description.otherinformationAuthor name used in this publication: K. H. Wongen_US
dc.description.otherinformationAuthor name used in this publication: C. L. Choyen_US
dc.identifier.spage5420-
dc.identifier.epage5424-
dc.identifier.volume92-
dc.identifier.issue9-
dcterms.abstractBi₄Ti₃O₁₂-SrBi₄Ti₄O[sub 15] (BT-SBTi) thin film was fabricated successfully on Pt/TiO₂/SiO₂/Si(110) substrates by the pulsed laser deposition technique. Films annealed at 650 °C by the rapid temperature process (RTP) have P[sub r]= 12 µC/cm² . But, the fatigue behavior has been observed although no obvious decrease in P[sub r] up to 10[sup 5] s retained time in the BT-SBTi capacitor. After being La doped, the Bi[sub 3.25]La[sub 0.75]Ti₃O₁₂-SrBi₄Ti₄O[sub 15] (BLT-SBTi) has fatigue free properties. P[sub r]= 13.5 µC/cm² was measured in a BLT-SBTi film of 300 nm thickness. It did not show any significant fatigue up to 10[sup 10] switching cycles above the applied field of 250 kV/cm. It also has good retention properties. The field dependence of fatigue behavior and La-doped effect are discussed.-
dcterms.accessRightsopen accessen_US
dcterms.bibliographicCitationJournal of applied physics, 1 Nov. 2002, v. 92, no. 9, p.5420-5424-
dcterms.isPartOfJournal of applied physics-
dcterms.issued2002-11-01-
dc.identifier.isiWOS:000178767200084-
dc.identifier.scopus2-s2.0-18744408864-
dc.identifier.eissn1089-7550-
dc.identifier.rosgroupidr12447-
dc.description.ros2002-2003 > Academic research: refereed > Publication in refereed journal-
dc.description.oaVersion of Recorden_US
dc.identifier.FolderNumberOA_IR/PIRAen_US
dc.description.pubStatusPublisheden_US
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