Please use this identifier to cite or link to this item: http://hdl.handle.net/10397/4985
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dc.contributorDepartment of Applied Physics-
dc.contributorMaterials Research Centre-
dc.creatorXu, Y-
dc.creatorTsai, Y-
dc.creatorZheng, DW-
dc.creatorTu, KN-
dc.creatorOng, CW-
dc.creatorChoy, CL-
dc.creatorZhao, B-
dc.creatorLiu, Q-
dc.creatorBrongo, M-
dc.date.accessioned2014-12-11T08:28:29Z-
dc.date.available2014-12-11T08:28:29Z-
dc.identifier.issn0021-8979-
dc.identifier.urihttp://hdl.handle.net/10397/4985-
dc.language.isoenen_US
dc.publisherAmerican Institute of Physicsen_US
dc.rights© 2000 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in Y. Xu et al., J. Appl. Phys. 88, 5744 (2000) and may be found at http://link.aip.org/link/?jap/88/5744.en_US
dc.subjectPolymer filmsen_US
dc.subjectPorous materialsen_US
dc.subjectPermittivityen_US
dc.subjectHardnessen_US
dc.subjectIndentationen_US
dc.subjectMaterials testingen_US
dc.subjectPoisson ratioen_US
dc.titleMeasurement of mechanical properties for dense and porous polymer films having a low dielectric constanten_US
dc.typeJournal/Magazine Articleen_US
dc.description.otherinformationAuthor name used in this publication: C. W. Ongen_US
dc.description.otherinformationAuthor name used in this publication: Chung Loong Choyen_US
dc.identifier.spage5744-
dc.identifier.epage5750-
dc.identifier.volume88-
dc.identifier.issue10-
dc.identifier.doi10.1063/1.1287756-
dcterms.abstractWe measured the mechanical properties of dense and porous polymeric films, the modified polyarylethers, which have a low dielectric constant varying from 2.7 to 1.8, by combining three different methods; membrane bulge test, nanoindentation, and single-substrate bending beam method. The elastic modulus and initial stress measured from these three methods are in good agreement. The substrate effect was observed in the measurements by nanoindentation. Data obtained by nanoindentation show a significant dependence on the film thickness and the displacement depth of the indenter. However, the hardness of the low dielectric constant thin film does not depend on thickness and only slightly depends on the indentation depth. A tentative analysis is proposed to explain the results.-
dcterms.accessRightsopen accessen_US
dcterms.bibliographicCitationJournal of applied physics, 15 Nov. 2000, v. 88, no. 10, p. 5744-5750-
dcterms.isPartOfJournal of applied physics-
dcterms.issued2000-11-15-
dc.identifier.isiWOS:000165068700036-
dc.identifier.scopus2-s2.0-0010512521-
dc.identifier.eissn1089-7550-
dc.identifier.rosgroupidr05460-
dc.description.ros2000-2001 > Academic research: refereed > Publication in refereed journal-
dc.description.oaVersion of Recorden_US
dc.identifier.FolderNumberOA_IR/PIRAen_US
dc.description.pubStatusPublisheden_US
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