Please use this identifier to cite or link to this item: http://hdl.handle.net/10397/457
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dc.contributorDepartment of Applied Physics-
dc.creatorZhu, JS-
dc.creatorQin, HX-
dc.creatorBao, ZH-
dc.creatorWang, Y-
dc.creatorCai, WY-
dc.creatorChen, PP-
dc.creatorLu, W-
dc.creatorChan, HLW-
dc.creatorChoy, CL-
dc.date.accessioned2014-12-11T08:27:48Z-
dc.date.available2014-12-11T08:27:48Z-
dc.identifier.issn0003-6951-
dc.identifier.urihttp://hdl.handle.net/10397/457-
dc.language.isoenen_US
dc.publisherAmerican Institute of Physicsen_US
dc.rights© 2001 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in J.S. Zhu et al. Appl. Phys. Lett. 79, 3827 (2001) and may be found at http://link.aip.org/link/?apl/79/3827en_US
dc.subjectStrontium compoundsen_US
dc.subjectBismuth compoundsen_US
dc.subjectTitanium compoundsen_US
dc.subjectFerroelectric ceramicsen_US
dc.subjectFerroelectric thin filmsen_US
dc.subjectX-ray diffractionen_US
dc.subjectRaman spectraen_US
dc.subjectFerroelectric storageen_US
dc.subjectVibrational statesen_US
dc.subjectGrain sizeen_US
dc.subjectCrystallisationen_US
dc.titleX-ray diffraction and Raman scattering study of SrBi₂Ta₂O[sub 9] ceramics and thin films with Bi₃TiNbO[sub 9] additionen_US
dc.typeJournal/Magazine Articleen_US
dc.identifier.spage3827-
dc.identifier.epage3829-
dc.identifier.volume79-
dc.identifier.issue23-
dcterms.abstractGood ferroelectric properties have previously been reported for both the (1-x)SrBi₂Ti₂O[sub 9]-xBi₃TiNbO[sub 9] bulk ceramics and thin films. In this work, x-ray diffraction and Raman scattering were used to investigate the effect of the incorporation of Bi₃TiNbO[sub 9] into SrBi₂Ta₂O[sub 9] bulk ceramics and thin films. A better crystallization, larger grain size and larger displacement of the Ta-O(4) or Ta-O(5) ions are the origin for the good ferroelectric properties of (1-x)SrBi₂Ta₂O[sub 9]-xBi₃TiNbO[sub 9] with x=0.3-0.4.-
dcterms.accessRightsopen accessen_US
dcterms.bibliographicCitationApplied physics letters, 3 Dec. 2001, v. 79, no. 23, p.3827-3829-
dcterms.isPartOfApplied physics letters-
dcterms.issued2001-12-03-
dc.identifier.isiWOS:000172362500027-
dc.identifier.scopus2-s2.0-0039147850-
dc.identifier.eissn1077-3118-
dc.identifier.rosgroupidr06910-
dc.description.ros2001-2002 > Academic research: refereed > Publication in refereed journal-
dc.description.oaVersion of Recorden_US
dc.identifier.FolderNumberOA_IR/PIRAen_US
dc.description.pubStatusPublisheden_US
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