Please use this identifier to cite or link to this item: http://hdl.handle.net/10397/43307
Title: Low cost universal high-k dielectric for solution processing and thermal evaporation organic transistors
Authors: Wang, Z
Ren, X
Fan, C
Chang, YH
Li, H
Chen, H
Feng, SP
Shi, S 
Chan, PKL
Keywords: High-k dielectric
Organic transistors
Surface energy
X-ray diffraction
Issue Date: 2014
Publisher: Wiley-VCH
Source: Advanced materials interfaces, 2014, v. 1, no. 3, 1300119 How to cite?
Journal: Advanced materials interfaces 
Abstract: The surface energy of UV-ozone treated BST dielectric is modulated by the storage duration and environment. By carefully controlling the surface energy, this low temperature, solution processed thin film is employed as the insulator for both thermal evaporated and solution processed OFETs. Both OFETs and saturated load inverters show high mobility and gain with an operating voltage less than 3 V.
URI: http://hdl.handle.net/10397/43307
ISSN: 2196-7350
DOI: 10.1002/admi.201300119
Appears in Collections:Journal/Magazine Article

Access
View full-text via PolyU eLinks SFX Query
Show full item record

SCOPUSTM   
Citations

6
Last Week
0
Last month
Citations as of Aug 11, 2017

WEB OF SCIENCETM
Citations

6
Last Week
0
Last month
Citations as of Aug 7, 2017

Page view(s)

32
Last Week
1
Last month
Checked on Aug 13, 2017

Google ScholarTM

Check

Altmetric



Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.