Please use this identifier to cite or link to this item: http://hdl.handle.net/10397/4244
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dc.contributorDepartment of Applied Physics-
dc.creatorWu, W-
dc.creatorWong, KH-
dc.creatorPang, GKH-
dc.creatorChoy, CL-
dc.date.accessioned2014-12-11T08:23:55Z-
dc.date.available2014-12-11T08:23:55Z-
dc.identifier.issn0003-6951-
dc.identifier.urihttp://hdl.handle.net/10397/4244-
dc.language.isoenen_US
dc.publisherAmerican Institute of Physicsen_US
dc.rights© 2005 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in W. Wu et al., Appl. Phys. Lett. 86, 072904 (2005) and may be found at http://apl.aip.org/resource/1/applab/v86/i7/p072904_s1en_US
dc.subjectLead compoundsen_US
dc.subjectFerroelectric thin filmsen_US
dc.subjectFerroelectric capacitorsen_US
dc.subjectThin film capacitorsen_US
dc.subjectEpitaxial layersen_US
dc.subjectAnnealingen_US
dc.subjectElectric domainsen_US
dc.subjectFerroelectric switchingen_US
dc.subjectDielectric hysteresisen_US
dc.subjectFerroelectric Curie temperatureen_US
dc.subjectTransmission electron microscopyen_US
dc.subjectX-ray diffractionen_US
dc.titleCorrelation between domain evolution and asymmetric switching in epitaxial Pb(Zr₀.₅₂Ti₀.₄₈)O₃ thin filmsen_US
dc.typeJournal/Magazine Articleen_US
dc.description.otherinformationAuthor name used in this publication: K. H. Wongen_US
dc.description.otherinformationAuthor name used in this publication: G. K. H. Pangen_US
dc.description.otherinformationAuthor name used in this publication: C. L. Choyen_US
dc.identifier.spage1-
dc.identifier.epage3-
dc.identifier.volume86-
dc.identifier.issue7-
dc.identifier.doi10.1063/1.1866506-
dcterms.abstractThe process-induced domain evolution and asymmetric switching in epitaxial Pb(Zr₀.₅₂Ti₀.₄₈)O₃(PZT) thin films have been studied by reciprocal space mapping, transmission electron microscopy, high-temperature x-ray diffraction, and the polarization-electric field hysteresis loop measurements. After annealing at reduced oxygen pressures, it was evidenced that an oxygen loss at the PZT bottom interface can occur at temperatures well below the Curie temperature T[sub C], and more importantly, the oxygen loss can induce a large positive voltage offset and drive simultaneously the polydomain formation in the PZT films. Our results indicate that the structure evolution is correlated with the coercive voltage shift, and an oxygen-loss-related internal stress at the interface would be responsible for the large internal electric field in epitaxial PZT films.-
dcterms.accessRightsopen accessen_US
dcterms.bibliographicCitationApplied physics letters, 14 Feb. 2005, v. 86, no. 7, 072904, p. 1-3-
dcterms.isPartOfApplied physics letters-
dcterms.issued2005-02-14-
dc.identifier.isiWOS:000227439400073-
dc.identifier.scopus2-s2.0-17044429840-
dc.identifier.eissn1077-3118-
dc.identifier.rosgroupidr22471-
dc.description.ros2004-2005 > Academic research: refereed > Publication in refereed journal-
dc.description.oaVersion of Recorden_US
dc.identifier.FolderNumberOA_IR/PIRAen_US
dc.description.pubStatusPublisheden_US
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