Please use this identifier to cite or link to this item: http://hdl.handle.net/10397/4215
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dc.contributorDepartment of Applied Physics-
dc.creatorHui, KC-
dc.creatorOng, HC-
dc.creatorLee, PF-
dc.creatorDai, J-
dc.date.accessioned2014-12-11T08:24:30Z-
dc.date.available2014-12-11T08:24:30Z-
dc.identifier.issn0003-6951-
dc.identifier.urihttp://hdl.handle.net/10397/4215-
dc.language.isoenen_US
dc.publisherAmerican Institute of Physicsen_US
dc.rights© 2005 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in K. C. Hui et al., Appl. Phys. Lett. 86, 152116 (2005) and may be found at http://apl.aip.org/resource/1/applab/v86/i15/p152116_s1en_US
dc.subjectZinc compoundsen_US
dc.subjectAluminium compoundsen_US
dc.subjectII-VI semiconductorsen_US
dc.subjectWide band gap semiconductorsen_US
dc.subjectSemiconductor thin filmsen_US
dc.subjectPhotoluminescenceen_US
dc.subjectCathodoluminescenceen_US
dc.subjectPhotoconductivityen_US
dc.subjectSurface statesen_US
dc.subjectEnergy gapen_US
dc.subjectDeep levelsen_US
dc.titleEffects of AlO[sub x]-cap layer on the luminescence and photoconductivity of ZnO thin filmsen_US
dc.typeJournal/Magazine Articleen_US
dc.description.otherinformationAuthor name used in this publication: P. F. Leeen_US
dc.description.otherinformationAuthor name used in this publication: J. Y. Daien_US
dc.identifier.spage1-
dc.identifier.epage3-
dc.identifier.volume86-
dc.identifier.issue15-
dc.identifier.doi10.1063/1.1900945-
dcterms.abstractThe effects of AlO[sub x]-cap layer on the optical and photoelectrical properties of ZnO films have been studied by cathodoluminescence (CL), photoluminescence (PL), and photoconductivity (PC). Both the PL and CL show that the cap layer improves the emission characteristics of ZnO by enhancing the band-edge emission while at the same time reducing the deep-level emissions. To study the origin of improvement, depth-resolved CL has been carried out to map out the emissions at different depths. It shows that the improvement occurs primarily at the film surface, which indicates the cap layer acts as a passivation layer that suppresses the detrimental surface states. The PC measurement on the capped ZnO at room temperature shows a distinctive excitonic feature at 3.29 eV and an overall increment of photoresponse above the band gap. Therefore, our results suggest a higher sensitivity of UV detection can be achieved in ZnO simply be employing a thin AlO[sub x]-cap layer.-
dcterms.accessRightsopen accessen_US
dcterms.bibliographicCitationApplied physics letters, 11 Apr. 2005, v. 86, no. 15, 152116, p. 1-3-
dcterms.isPartOfApplied physics letters-
dcterms.issued2005-04-11-
dc.identifier.isiWOS:000228901600061-
dc.identifier.scopus2-s2.0-20844443622-
dc.identifier.eissn1077-3118-
dc.identifier.rosgroupidr22889-
dc.description.ros2004-2005 > Academic research: refereed > Publication in refereed journal-
dc.description.oaVersion of Recorden_US
dc.identifier.FolderNumberOA_IR/PIRAen_US
dc.description.pubStatusPublisheden_US
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