Please use this identifier to cite or link to this item: http://hdl.handle.net/10397/32839
DC FieldValueLanguage
dc.contributorDepartment of Applied Physics-
dc.creatorTu, YT-
dc.creatorZhou, GD-
dc.creatorDai, JY-
dc.creatorLi, J-
dc.creatorChen, P-
dc.creatorQiu, XY-
dc.date.accessioned2015-05-26T08:13:31Z-
dc.date.available2015-05-26T08:13:31Z-
dc.identifier.issn1058-4587-
dc.identifier.urihttp://hdl.handle.net/10397/32839-
dc.language.isoenen_US
dc.publisherTaylor & Francisen_US
dc.titleWeak Ferromagnetism of HfO2 Film on Compressively Strained Si83Ge17/Si Substrateen_US
dc.typeJournal/Magazine Articleen_US
dc.identifier.spage10-
dc.identifier.epage12-
dc.identifier.volume134-
dc.identifier.doi10.1080/10584587.2012.663647-
dcterms.bibliographicCitationIntegrated ferroelectrics, 2012, v. 134, p. 10-12-
dcterms.isPartOfIntegrated ferroelectrics-
dcterms.issued2012-
dc.identifier.isiWOS:000303570200003-
dc.identifier.eissn1607-8489-
dc.identifier.rosgroupidr59621-
dc.description.ros2011-2012 > Academic research: refereed > Publication in refereed journal-
Appears in Collections:Journal/Magazine Article
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