Please use this identifier to cite or link to this item: http://hdl.handle.net/10397/3271
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dc.contributorDepartment of Applied Physics-
dc.creatorWu, Z-
dc.creatorHuang, W-
dc.creatorWong, KH-
dc.creatorHao, JH-
dc.date.accessioned2014-12-11T08:23:10Z-
dc.date.available2014-12-11T08:23:10Z-
dc.identifier.issn0021-8979-
dc.identifier.urihttp://hdl.handle.net/10397/3271-
dc.language.isoenen_US
dc.publisherAmerican Institute of Physicsen_US
dc.rights© 2008 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in Z.P. Wu et al., J. Appl. Phys. 104, 054103 (2008) and may be found at http://jap.aip.org/resource/1/japiau/v104/i5/p054103_s1.en_US
dc.subjectAtomic force microscopyen_US
dc.subjectCrystal orientationen_US
dc.subjectFerroelectric thin filmsen_US
dc.subjectMolecular beam epitaxial growthen_US
dc.subjectPermittivityen_US
dc.subjectReflection high energy electron diffractionen_US
dc.subjectStrontium compoundsen_US
dc.titleStructural and dielectric properties of epitaxial SrTiO₃films grown directly on GaAs substrates by laser molecular beam epitaxyen_US
dc.typeJournal/Magazine Articleen_US
dc.description.otherinformationAuthor name used in this publication: Z. P. Wuen_US
dc.description.otherinformationAuthor name used in this publication: K. H. Wongen_US
dc.identifier.spage1-
dc.identifier.epage3-
dc.identifier.volume104-
dc.identifier.issue5-
dc.identifier.doi10.1063/1.2974796-
dcterms.abstractEpitaxial SrTiO₃films were grown on GaAs (001) substrates without any buffer layers using laser molecular beam epitaxy technique. The reflection high-energy electron diffraction observations have revealed that a layer-by-layer growth of SrTiO₃was achieved at optimized deposition conditions. The crystalline orientation of the as-grown SrTiO₃(001) films rotates 45° in plane with respect to the GaAs substrates. Atomic force microscope studies show that these films possess atomically flat surfaces. The dielectric properties of the heterostructure were also investigated. Our results have clearly demonstrated the practicality of integrating perovskite oxide thin films with GaAs substrates.-
dcterms.accessRightsopen accessen_US
dcterms.bibliographicCitationJournal of applied physics, 1 Sept. 2008, v. 104, no. 5, 054103, p. 1-3-
dcterms.isPartOfJournal of applied physics-
dcterms.issued2008-09-01-
dc.identifier.isiWOS:000259853600089-
dc.identifier.scopus2-s2.0-51849164500-
dc.identifier.eissn1089-7550-
dc.identifier.rosgroupidr43441-
dc.description.ros2008-2009 > Academic research: refereed > Publication in refereed journal-
dc.description.oaVersion of Recorden_US
dc.identifier.FolderNumberOA_IR/PIRAen_US
dc.description.pubStatusPublisheden_US
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