Please use this identifier to cite or link to this item: http://hdl.handle.net/10397/29216
Title: Study of light-induced annealing effects in a-Si:H thin films
Authors: Ho, WY
Surya, C 
Issue Date: 2001
Source: Microelectronics and reliability, 2001, v. 41, no. 6, p. 913-917 How to cite?
Journal: Microelectronics and Reliability 
Abstract: Light-induced metastability was examined in hydrogenated amorphous silicon thin films using a 500 W xenon lamp and a 10 mW HeCd laser. Positron beam annihilation spectroscopy (PAS) and fourier transform infrared spectroscopy (FTIR) were examined to investigate the effects of light on the structural properties of the films. The experimental results exhibited significant decrease in the S-parameter of the PAS, indicating marked reduction in the defect density of the films. The FTIR spectroscopy showed significant reduction in the transmission coefficient of IR radiation at frequencies corresponding to Si-H and Si-H 3 phonon modes, indicating that the observed annealing effects were due to light-induced formation of Si-H and Si-H 3 bonds. A second thermal annealing process conducted after the light exposure experiment resulted in a further substantial decrease in defect density for the sample exposed to HeCd laser. The experimental results are explained by a competing, light induced, dangling bond creation/annealing process, in which the incoming photons caused the annealing of dangling bonds, particularly those at around the voids. However, in the bulk region, the photons caused both the breaking of weak Si-Si bonds as well as the annealing of dangling bonds.
URI: http://hdl.handle.net/10397/29216
ISSN: 0026-2714
DOI: 10.1016/S0026-2714(01)00012-9
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