Please use this identifier to cite or link to this item: http://hdl.handle.net/10397/28481
Title: Polymer pen lithography using dual-elastomer tip arrays
Authors: Xie, Z
Shen, Y
Zhou, X
Yang, Y
Tang, Q
Miao, Q
Su, J
Wu, H
Zheng, Z
Keywords: dip-pen nanolithography
polymer pen lithography
scanning probe lithography
soft lithography
surface patterning
Issue Date: 2012
Publisher: Wiley-VCH
Source: Small, 2012, v. 8, no. 17, p. 2664-2669 How to cite?
Journal: Small 
Abstract: Dual-elastomer tip arrays are developed as a simple and cost-effective approach to significantly improve the uniformity and precision of polymer pen lithography (PPL). Both experiment and mechanical simulation demonstrate that the hard-apex, soft-base tip structure of the dual-elastomer tip array leads to precise control of feature size and reduced variation among different tips over large areas through fine control of the tip deformation. The dual-elastomer tip array is believed to be readily applied to fabricate nano- and microstructures for fundamental study and applications such as bioassays, sensors, optical and electronic devices.
URI: http://hdl.handle.net/10397/28481
ISSN: 1613-6810
EISSN: 1613-6829
DOI: 10.1002/smll.201200849
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