Please use this identifier to cite or link to this item: http://hdl.handle.net/10397/27218
Title: Effect of stress on phase transition of ferroelectric films
Authors: Chung, WYW
Lo, VC
Keywords: Ferroelectrics
Four-state potts model
Phase transition
Stress
Thin films
Issue Date: 2006
Publisher: Institute of Pure and Applied Physics
Source: Japanese journal of applied physics. Part 1, Regular papers and short notes 2006, v. 45, no. 10 a, p. 7801-7805 How to cite?
Journal: Japanese journal of applied physics. Part 1, Regular papers and short notes 
Abstract: The effect of stress on the ferroelectric-paraelectric phase transition temperature of ferroelectric thin films has been evaluated using a modified planar-type four-state Potts model. In this model, it is assumed that the electromechanical effect is induced by the association between the dipole orientation and the strain state in individual perovskite cells. The mechanical energy density, which is equal to the product of stress and strain, gives rise to the additional contribution to the system Hamiltonian. The rotation of dipoles, governed by the change in Hamiltonian as in the usual Metropolis algorithm, gives rise to various ferroelectric properties. The shift in phase transition in the presence of transverse stress is demonstrated and compared with experimental results based on the position of the susceptibility peak [T. R. Taylor et al.: Appl. Phys. Lett. 80 (2002) 1978; K. Abe et al.: J. Appl. Phys. 77 (1995) 6461].
URI: http://hdl.handle.net/10397/27218
ISSN: 0021-4922
EISSN: 1347-4065
DOI: 10.1143/JJAP.45.7801
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