Please use this identifier to cite or link to this item: http://hdl.handle.net/10397/25900
Title: Temperature dependence of resistance in reactively sputtered RuO2 thin films
Authors: Tong, KY
Jelenkovic, V
Cheung, WY
Wong, SP
Issue Date: 2001
Publisher: Kluwer Academic Publ
Source: Journal of materials science letters, 2001, v. 20, no. 8, p. 699-700 How to cite?
Journal: Journal of Materials Science Letters 
Abstract: Ruthenium dioxide (RuO2) is a stable conductive and semi-transparent oxide. This paper provides a comprehensive description of the electrical characteristics of reactively sputtered RuO2 film, including some Hall effect measurements which have not been reported before.
URI: http://hdl.handle.net/10397/25900
ISSN: 0261-8028
DOI: 10.1023/A:1010902806603
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