Please use this identifier to cite or link to this item: http://hdl.handle.net/10397/25896
Title: Growth and optical properties of (KNa) 0.1 (Sr 0.61 Ba 0.39 ) 0.9 Nb2 O6 thin films by pulsed laser deposition
Authors: Zhang, Y
Tao, K
Ma, Y
Yang, S
Wang, B
Mak, CL 
Wong, KH 
Issue Date: 2007
Publisher: Institute of Pure and Applied Physics
Source: Japanese journal of applied physics, 2007, v. 46, no. 3A, p. 1063-1066 How to cite?
Journal: Japanese journal of applied physics 
Abstract: Epitaxial (KNa)0.1Sr0.61Ba0.39)0.9Nb2O6 (KNSBN:61) thin films deposited on MgO(100) substrates have been prepared by pulsed laser deposition (PLD). The structural properties of the thin films have been examined by X-ray diffraction analysis. An X-ray diffraction 2θ scan indicates single crystalline layers with the (001) orientation perpendicular to the substrate plane. The optical transmission spectra of the thin films have been obtained in the spectral range of 200–900 nm, and their optical constants (refractive index n and extinction coefficient k) have been determined. It has been found that the refractive index of the thin films is similar to that of a KNSBN:61 single bulk crystal. The birefringent shift as a function of the applied voltage of the thin films on fused silica has been measured, and the quadratic electro optic coefficient R has been derived to be 0.4×10-16(m/V)2 at 6328 Å.
URI: http://hdl.handle.net/10397/25896
ISSN: 0021-4922
EISSN: 1347-4065
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