Please use this identifier to cite or link to this item: http://hdl.handle.net/10397/24564
Title: Wettability transition of plasma-treated polystyrene micro/nano pillars-aligned patterns
Authors: Kong, J
Yung, KL 
Xu, Y
Tian, W
Keywords: Nanomaterials
Nanopillars
Patterns
Wettability
Issue Date: 2010
Publisher: Budapest Univ Technol & Econ
Source: Express polymer letters, 2010, v. 4, no. 12, p. 753-762 How to cite?
Journal: Express Polymer Letters 
Abstract: This paper reports the wettability transition of plasma-treated polystyrene (PS) micro/nano pillars-aligned patterns. The micro/nano pillars were prepared using hot embossing on silicon microporous template and alumina nanoporous template, which were fabricated by ultraviolet (UV) lithography and inductive coupled plasma (ICP) etching, and two-step anodic oxidation, respectively. The results indicate that the combination of micro/nano patterning and plasma irradiation can easily regulate wettabilities of PS surfaces, i.e. from hydrophilicity to hydrophobicity, or from hydrophobicity to superhydrophilicity. During the wettability transition from hydrophobicity to hydrophilicity there is only mild hydrophilicity loss. After plasma irradiation, moreover, the wettability of PS micro/nano pillars-aligned patterns is more stable than that of flat PS surfaces. The observed wettability transition and wettability stability of PS micro/nano pillars-aligned patterns are new phenomena, which may have potential in creating programmable functional polymer surfaces.
URI: http://hdl.handle.net/10397/24564
DOI: 10.3144/expresspolymlett.2010.91
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