Please use this identifier to cite or link to this item: http://hdl.handle.net/10397/24340
Title: Post-annealing treatments and interface effects on anomalous magnetic characteristics of HfOx film
Authors: Qiu, XY
Li, J
Chen, P
Zhang, Y
Tu, YT
Wang, XH
Lu, W
Keywords: HfOx films
Interface microstructures
Magnetic characteristics
Issue Date: 2013
Publisher: Taylor & Francis
Source: Integrated ferroelectrics, 2013, v. 141, no. 1, p. 145-153 How to cite?
Journal: Integrated ferroelectrics 
Abstract: Interface microstructures and anomalous magnetic characteristics of HfOx film annealed under different conditions have been investigated using X-ray diffraction, X-ray photoelectron spectroscope, high-resolution transmission electron microscopy and superconducting quantum interference device. It is demonstrated that HfOx samples have monoclinic crystal structure and an interface layer of Hf-silicate mixed with Hf-silicide. Remarkable ferromagnetic signals and obvious magnetic anisotropy are observed, and they are greatly affected by the post-annealing temperature and ambient. It is believed that oxygen vacancies and interface defects are responsible for the anomalous magnetic characteristics of HfOx films.
Description: International Symposium on Integrated Functionalities, ISIF 2012, Hong Kong, 18-21 June 2012
URI: http://hdl.handle.net/10397/24340
ISSN: 1058-4587
EISSN: 1607-8489
DOI: 10.1080/10584587.2013.787673
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