Please use this identifier to cite or link to this item: http://hdl.handle.net/10397/23295
Title: Arrays of nanoscale lenses for subwavelength optical lithography
Authors: Jang, JW
Zheng, Z 
Lee, OS
Shim, W
Zheng, G
Schatz, GC
Mirkin, CA
Keywords: Dip-pen
Finite element method
Lens
Lithography
Nano
Phase-shift
Photomask
Photoresist
Poly(ethylene glycol)
Simulation
Issue Date: 2010
Publisher: American Chemical Society
Source: Nano letters, 2010, v. 10, no. 11, p. 4399-4404 How to cite?
Journal: Nano letters 
Abstract: Poly(ethylene glycol) (PEG) polymer lens arrays are made by using dip-pen nanolithography to deposit nanoscale PEG features on hydrophobically modified quartz glass. The dimensions of the PEG lenses are controlled by tuning dwell time and polymer molecular weight. The PEG polymer lenses on the quartz substrate act as a phase-shift photomask for fabricating subwavelength scale features, ∼100 nm in width. Depending upon UV irradiation time during the photolithography, the photoresist nanostructures can be transitioned from well-shaped (short time) to ring-shaped (long time) features. The technique can be used to pattern large areas through the use of cantilever arrays.
URI: http://hdl.handle.net/10397/23295
ISSN: 1530-6984
EISSN: 1530-6992
DOI: 10.1021/nl101942s
Appears in Collections:Journal/Magazine Article

Access
View full-text via PolyU eLinks SFX Query
Show full item record

SCOPUSTM   
Citations

29
Last Week
0
Last month
0
Citations as of Aug 3, 2017

WEB OF SCIENCETM
Citations

30
Last Week
0
Last month
0
Citations as of Aug 15, 2017

Page view(s)

33
Last Week
2
Last month
Checked on Aug 14, 2017

Google ScholarTM

Check

Altmetric



Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.