Please use this identifier to cite or link to this item: http://hdl.handle.net/10397/22140
Title: Taguchi methods to optimize TiN coating surface roughness
Authors: Yim, SL
Yu, KM 
Kwok, D
Lee, TC
Keywords: Optimization
PVD coating
Roughness
Taguchi method
Titanium nitride
Issue Date: 2004
Publisher: Trans Tech Publications Ltd
Source: Materials science forum, 2004, v. 471-472, p. 891-894 How to cite?
Journal: Materials science forum 
Abstract: Cathodic Arc Physical Vapor deposition (CAPVD) uses a high current, low and negative voltage arc to vaporize a cathodic electrode (cathodic arc) and deposit the vaporized material on a substrate. The vaporized material is ionized in a vacuum chamber and the substrates are usually biased so as to accelerate the ions to the substrate surface. CAPVD provides a very dense film with excellent adhesion to the substrates. Therefore, this technique is mainly used to deposit on cutting tools such as end mills, drills, inserts, plastics and metal molds and high wear resistance tribology components. However, this coating technique will produce unwanted micro particles (droplets) [1] which usually are the target materials that cannot be reacted in coating process. These particles will affect the coating roughness and the surface morphology. To optimize this condition, Taguchi method is introduced to obtain the best experimental parameter settings. In this study, Atomic Force Microscope (AFM) is used to analyze the roughness of the coating for the following factors: bias voltage, arc current, nitrogen pressure and coating thickness.
Description: 11th International Manufacturing Conference - Advances in Materials Manufacturing Science and Technology., Jinan, 18-20 September 2004
URI: http://hdl.handle.net/10397/22140
ISSN: 0255-5476
EISSN: 1662-9752
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