Please use this identifier to cite or link to this item: http://hdl.handle.net/10397/18592
DC FieldValueLanguage
dc.contributorDepartment of Applied Physics-
dc.creatorHuang, W-
dc.creatorZhu, J-
dc.creatorZeng, HZ-
dc.creatorWei, XH-
dc.creatorZhang, Y-
dc.creatorLi, YR-
dc.creatorHao, JH-
dc.date.accessioned2015-06-23T09:06:30Z-
dc.date.available2015-06-23T09:06:30Z-
dc.identifier.issn1359-6462-
dc.identifier.urihttp://hdl.handle.net/10397/18592-
dc.language.isoenen_US
dc.publisherPergamon Pressen_US
dc.subjectFerroelectric propertiesen_US
dc.subjectFerromagnetic filmsen_US
dc.subjectHeteroepitaxyen_US
dc.subjectStrainen_US
dc.titleEffect of strain on the ferroelectric properties in epitaxial perovskite titanate thin films grown on ferromagnetic CoFe2O4 layersen_US
dc.typeJournal/Magazine Articleen_US
dc.identifier.spage1118-
dc.identifier.epage1120-
dc.identifier.volume58-
dc.identifier.issue12-
dc.identifier.doi10.1016/j.scriptamat.2008.02.009-
dcterms.abstractA BaTiO3/CoFe2O4 heterostructure was fabricated by laser molecular beam epitaxy. The effects of strain on the microstructures, domain morphologies and ferroelectric properties of BaTiO3 thin films were studied systematically. Ferroelectric properties in a 40-nm-thick BaTiO3 film were suppressed owing to a reduced tetragonality induced by the strain between BaTiO3 and the underlying CoFe2O4. For a 100-nm-thick film, BaTiO3 exhibits improved the ferroelectric properties with an out-of-plane polarization (2Pr) of 36.4 μC cm-2 and an electric coercivity field of 104 kV cm-1. The results show that the thickness of BaTiO3 can significantly affect the interfacial strain and hence the ferroelectric properties of the BaTiO3/CoFe2O4 heterostructure.-
dcterms.bibliographicCitationScripta materialia, 2008, v. 58, no. 12, p. 1118-1120-
dcterms.isPartOfScripta materialia-
dcterms.issued2008-
dc.identifier.isiWOS:000255900200021-
dc.identifier.scopus2-s2.0-42149167258-
dc.identifier.eissn1872-8456-
dc.identifier.rosgroupidr38597-
dc.description.ros2007-2008 > Academic research: refereed > Publication in refereed journal-
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