Please use this identifier to cite or link to this item: http://hdl.handle.net/10397/16963
Title: A performance tradeoff function for evaluating suggested parameters in the reactive ion etching process
Authors: Lau, HCW
Tang, CXH
Leung, BPK 
Lee, CKM
Ho, GTS
Keywords: Global optimization
Inverted beta loss function
Machine performance
Process parameter setting
Issue Date: 2009
Publisher: Institute of Electrical and Electronics Engineers
Source: IEEE transactions on systems, man, and cybernetics. Part A, Systems and humans, 2009, v. 39, no. 4, p. 933-938 How to cite?
Journal: IEEE transactions on systems, man, and cybernetics. Part A, Systems and humans 
Abstract: Reactive ion etching (RIE) is a process in the fabrication of semiconductor devices. The ability to predict the influence of the process parameters of RIE is crucial in terms of machine performance as they may have a serious impact on product quality as well as on the probability of machine failure. To address this issue, this correspondence paper presents a novel performance tradeoff function for evaluating the overall suitability of adopting the predicted control parameters suggested by domain experts, taking into full consideration their impact on the performance of the machine involved. An experiment using the RIE machine is provided to validate the practicability of the proposed approach.
URI: http://hdl.handle.net/10397/16963
ISSN: 1083-4427
EISSN: 1083-4419
DOI: 10.1109/TSMCA.2009.2019877
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