Please use this identifier to cite or link to this item: http://hdl.handle.net/10397/16806
Title: Fabrication of nano-scaled patterns on ceramic thin films and silicon substrates by soft ultraviolet nanoimprint lithography
Authors: Jim, KL
Lee, FK
Xin, JZ
Leung, CW 
Chan, HLW 
Chen, Y
Keywords: Ferroelectric materials
Nanoimprint lithography
Photonic crystals
Issue Date: 2010
Publisher: Elsevier
Source: Microelectronic engineering, 2010, v. 87, no. 5-8, p. 959-962 How to cite?
Journal: Microelectronic engineering 
Abstract: Soft ultraviolet nanoimprint lithography is a cost-effective and versatile technique for the transfer of nano-scaled patterns to various surfaces. Here, we report on the fabrication of sub-micron square pillar arrays in epitaxial Ba0.7Sr0.3TiO3 ceramic films, using a combination of nanoimprint lithography and inductively coupled plasma etching techniques. Based on a similar approach we have also succeeded in preparing positive (direct) and negative (inverse) replicas of silicon master molds. Such a generic process could find application in various materials.
URI: http://hdl.handle.net/10397/16806
ISSN: 0167-9317
EISSN: 1873-5568
DOI: 10.1016/j.mee.2009.11.141
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