Please use this identifier to cite or link to this item: http://hdl.handle.net/10397/14291
Title: LASER light scribe and microwave annealing reduction of graphene oxide for supercapacitor applications
Authors: Cheng, KH
Cheng, CH 
Chao, AKA
Lo, DKC
Issue Date: 2015
Publisher: Institute of Electrical and Electronics Engineers Inc.
Source: 2015 IEEE 10th International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2015, 2015, 7147448, p. 380-383 How to cite?
Abstract: We presented a rapid and scalable method to fabricate reduced graphene oxide (rGO) by LASER and microwave annealing. The reduction of graphene oxide (GO) film by Laser light scribe DVD drive and by household microwave oven for scalable and rapid production was demonstrated. LASER light scribe reduction of GO (LSGO) can produce patterns for integrated circuits. Furthermore, microwave irradiation of GO enables rapid reduction of GO within seconds. The rGO produced was used to make graphene-based electrodes which exhibit supercapacitor characteristics. The fabrication and measurement results of rGO electrodes by LASER-only and by LASER-with-microwave-Aided methods were compared. Microwave annealing is an ultrafast and cost-effective way to improve the quality of reduction of GO. The energy storage per unit area for the LASER with microwave aided reduction device is around 20Wh/Kg. The microwave aided LSGO produced was then fabricated to make graphene-based electrodes which have wide range of applications including batteries, fuel cell and supercapacitors.
Description: 10th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2015, 7-11 April 2015
URI: http://hdl.handle.net/10397/14291
ISBN: 9.78E+12
DOI: 10.1109/NEMS.2015.7147448
Appears in Collections:Conference Paper

Access
View full-text via PolyU eLinks SFX Query
Show full item record

SCOPUSTM   
Citations

1
Last Week
0
Last month
0
Citations as of Sep 11, 2017

Page view(s)

67
Last Week
6
Last month
Checked on Sep 17, 2017

Google ScholarTM

Check

Altmetric



Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.