Please use this identifier to cite or link to this item: http://hdl.handle.net/10397/13430
Title: Microstructure and mechanical properties of B4C films deposited by ion beam sputtering
Authors: Zhou, MJ
Wong, SF
Ong, CW 
Li, Q
Keywords: Boron carbide
Ion beam sputtering
Thin films
Issue Date: 2007
Publisher: Elsevier Science Sa
Source: Thin solid films, 2007, v. 516, no. 2-4, p. 336-339 How to cite?
Journal: Thin Solid Films 
Abstract: Boron carbide thin films were deposited on silicon substrates using ion beam sputtering at different substrate temperatures. The chemical composition and the microstructure of the films were analyzed by X-ray photoelectron spectroscopy, and transmission electron microscopy, respectively. Although all films are amorphous despite their deposition temperature, their radial distribution functions derived from the transmission electron diffraction pattern disclose differences in the short-range order for films deposited below and above 350 °C. The nanoindentation hardness of the films was measured using a nanoindentor. The internal stress of the films was evaluated using a profiler based on Stoney's equation. The experimental results suggest that the different hardness of the films is determined by the microstructure, rather than external factors.
URI: http://hdl.handle.net/10397/13430
DOI: 10.1016/j.tsf.2007.06.030
Appears in Collections:Journal/Magazine Article

Access
View full-text via PolyU eLinks SFX Query
Show full item record

SCOPUSTM   
Citations

27
Last Week
0
Last month
0
Citations as of Jun 26, 2017

WEB OF SCIENCETM
Citations

24
Last Week
0
Last month
0
Citations as of Jun 23, 2017

Page view(s)

34
Last Week
1
Last month
Checked on Jun 25, 2017

Google ScholarTM

Check

Altmetric



Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.