Please use this identifier to cite or link to this item: http://hdl.handle.net/10397/13405
Title: Morphology and growth of electrodeposited cuprous oxide under different values of direct current density
Authors: Hu, F
Chan, KC 
Yue, TM 
Keywords: Cuprous oxide
Direct current electrodeposition
Morphology
Scanning electron microscopy
X-ray diffraction
Issue Date: 2009
Publisher: Elsevier
Source: Thin solid films, 2009, v. 518, no. 1, p. 120-125 How to cite?
Journal: Thin solid films 
Abstract: The growth of Cu 2O thin films electrodeposited by a two-electrode system with acid and alkaline electrolytes under different values of direct current (DC) densities was investigated. The microstructure of Cu 2O thin films produced in the acid electrolyte changes from a ring shape to a cubic shape with increasing DC density, and the microstructure of Cu 2O thin films produced in the alkaline electrolyte has a typical pyramid shape. The X-ray diffraction results show that Cu 2O thin films can be electrodeposited over a larger current domain than those deposited by a three-electrode system. The growth of Cu 2O thin films is examined under this domain, and the electrocrystallization process of such films is discussed taking into consideration the effect of current density on nucleation, cluster growth, and crystal growth.
URI: http://hdl.handle.net/10397/13405
ISSN: 0040-6090
EISSN: 1879-2731
DOI: 10.1016/j.tsf.2009.07.010
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