Please use this identifier to cite or link to this item: http://hdl.handle.net/10397/13158
Title: Anisotropy of weak ferromagnetism of HfAlOx film deposited by magnetron sputtering
Authors: Zhou, GD
Zhang, SY
Tu, YT
Li, J
Chen, P
Dai, JY 
Qiu, XY
Issue Date: 2012
Publisher: Taylor & Francis
Source: Integrated ferroelectrics, 2012, v. 134, p. 13-15 How to cite?
Journal: Integrated ferroelectrics 
URI: http://hdl.handle.net/10397/13158
ISSN: 1058-4587
EISSN: 1607-8489
DOI: 10.1080/10584587.2012.663652
Appears in Collections:Journal/Magazine Article

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