Please use this identifier to cite or link to this item: http://hdl.handle.net/10397/10897
Title: Multiresponse optimization of surface plasma treatment using Taguchi method
Authors: Yung, KC 
Liem, H
Choy, HS
Zheng, HF
Yue, TM 
Keywords: Optimization
Plasma surface treatment
Printed circuit board
Taguchi method
Issue Date: 2010
Publisher: Taylor & Francis Inc
Source: Materials and manufacturing processes, 2010, v. 25, no. 9, p. 1001-1011 How to cite?
Journal: Materials and Manufacturing Processes 
Abstract: Emerging plasma treatment on printed circuit boards has many applications from desmearing to micro/nanomanipulating of surface chemistry. However, the methodology to predict their mechanism behaviors and quantify their process performance is hampered by the fact that each plasma treatment response is very sensitive to a small change in a technologic parameter, undesirably causing detrimental effect on the overall response. This study thus uses Taguchi's parameter design to identify the essential technologic parameters affecting the plasma treatment performance. The factor combinations for process performance optimization are observed to be intrinsically distinct for different polymer substrates. The optimal level correlation between responses and control factors is established by means of signal-to-noise (S/N) ratio. The analysis of variance is employed to identify the priority of factor influence. Finally, both predicted and experimental results are compared to determine the efficacy of using the proposed methodology to optimize the surface plasma treatment process.
URI: http://hdl.handle.net/10397/10897
DOI: 10.1080/10426910903365794
Appears in Collections:Journal/Magazine Article

Access
View full-text via PolyU eLinks SFX Query
Show full item record

SCOPUSTM   
Citations

7
Last Week
0
Last month
0
Citations as of Sep 9, 2017

WEB OF SCIENCETM
Citations

6
Last Week
0
Last month
0
Citations as of Sep 22, 2017

Page view(s)

45
Last Week
3
Last month
Checked on Sep 18, 2017

Google ScholarTM

Check

Altmetric



Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.