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Title: Exchange bias study of CoFeB/IrMn antidot and nanodot arrays fabricated by nanosphere lithography
Authors: Li, X
Leung, CW 
Lin, KW
Chan, MS
Pong, PWT
Issue Date: 2016
Source: 2016 5th International Symposium on Next-Generation Electronics (ISNE), Hsinchu, Taiwan, 4-5 May 2016, p. 1-2
Abstract: Exchange bias effect in nanostructures are widely investigated for applications in nanometric spintronic sensors. In this work, nanosphere lithography was adopted to pattern CoFeB/IrMn antidot and nanodot arrays. The exchange bias and coercivity of the nanostructures and continuous films exhibit similar exponential dependence on CoFeB layer thickness. High temperature annealing results in decreased exchange bias and coercivity. This work provides physical insights on magnetization reversal response in nanosized spintronic devices.
Keywords: Exchange bias
Nanosphere lithography
Nanostructures
Publisher: IEEE
ISBN: 978-1-5090-2439-1 (Electronic)
DOI: 10.1109/ISNE.2016.7543341
Rights: © 2016 IEEE. Personal use of this material is permitted. Permission from IEEE must be obtained for all other uses, in any current or future media, including reprinting/republishing this material for advertising or promotional purposes, creating new collective works, for resale or redistribution to servers or lists, or reuse of any copyrighted component of this work in other works.
The following publication X. Li, C. W. Leung, K. . -W. Lin, M. S. Chan and P. W. T. Pong, "Exchange bias study of CoFeB/IrMn antidot and nanodot arrays fabricated by nanosphere lithography," 2016 5th International Symposium on Next-Generation Electronics (ISNE), Hsinchu, Taiwan, 2016, pp. 1-2 is available at https://doi.org/10.1109/ISNE.2016.7543341.
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