Browsing by Keyword Semiconductor-insulator boundaries

Showing results 1 to 3 of 3
DateTitleAuthor(s)
15-Mar-2003Growth and characterization of Hf-aluminate high-k gate dielectric ultrathin films with equivalent oxide thickness less than 10 ÅLee, PF; Dai, J ; Wong, KH; Chan, HLW ; Choy, CL
15-Jul-2003Epitaxial growth of yttrium-stabilized HfO₂ high-k gate dielectric thin films on SiDai, J ; Lee, PF; Wong, KH; Chan, HLW ; Choy, CL
1-May-2006Comparison of interfacial and electrical characteristics of HfO₂and HfAlO high-k dielectrics on compressively strained Si[sub 1−x]Ge[sub x]Curreem, KKS; Lee, PF; Wong, KS; Dai, J ; Zhou, MJ; Wang, J; Li, Q